Methods
CVD - VPE - ALD - VPD
Types
Processes
 

TYPES OF SURFACE TREATMENTS
Acronym Description Notes
     
PVD Physical
Vapour Deposition
with gas in
molecular
regime
(Kn>1).
TE Thermal Evaporation Evaporazione Termica (Galileo-type) Effetto Joule
CAD Cathodic Arc Deposition Evaporazione ad Arco Arco Elettrico
E-beam Electron-beam Evaporation Cannone Elettronico Elettroni
IBAD Ion Beam Assisted Deposition Ion Beam Assisted Deposition Ioni
Sputtering Sputtering Sputtering Plasma
LA Laser Ablation Ablazione Laser Laser
CVD Chemical Vapour Deposition


with gas in
viscous
regime
(Kn<0,01).

AcCVD Actuvation
Chemical Vapour Deposition
 
MoCVD

Metallorganic
Chemical Vapour Deposition

 
SaCVD Saline
Chemical Vapour Deposition
 
ALD Atomic Layer Deposition  
VPE Vapour Phase Epitaxy The conditions are the same as in CVD, but the growth is Epitaxial
VPD Vapour Phase Deposition
MBE Molecular Beam
Epitaxy
Epitaxial growth in ultra-high vacuum, (UHV=10^-7-->10^-11 mbar)
with the gas in molecular regime (Kn>1).

 


The Comments-section below is meant to be a common tool for the scientific comunity.
We are very pleased to receive your comments, which can be additions or corrections referred to the above webpage.
Every page on our website has the possibility to insert comments.

Comments

No comments yet.

Add Comment